Modeling aspects to improve the solution of the inverse problem in scatterometry

DOI10.3934/DCDSS.2015.8.497MaRDI QIDQ479110zbMATH OpenOpenAlexFDO

Authors Hermann Gross, Sebastian Heidenreich, Mark-Alexander Henn, Markus Bär, Andreas Rathsfeld

Publication date 5 December 2014

Published in Discrete and Continuous Dynamical Systems. Series S (Search for Journal in Brave)

Copyright license Creative Commons Attribution 4.0 International

Full work available at URL https://doi.org/10.3934/dcdss.2015.8.497

zbMATH Keywords

inverse problemMonte Carlo methodFisher matrixuncertaintiesFourier opticsscatterometryerror modelline edge roughness

Mathematics Subject Classification ID

Monte Carlo methods (65C05) Scattering theory, inverse scattering involving ordinary differential operators (34L25) Scattering theory for PDEs (35P25) Inverse problems for PDEs (35R30) Numerical methods for discrete and fast Fourier transforms (65T50)

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Cites work

• scientific article; zbMATH DE number 3422963 (Why is no real title available?)
• scientific article; zbMATH DE number 46855 (Why is no real title available?)
• A frequency-domain formulation of the Fréchet derivative to exploit the inherent parallelism of the distorted Born iterative method
• Application of an Ultra Weak Variational Formulation of Elliptic PDEs to the Two-Dimensional Helmholtz Problem
• Convergence of the Galerkin Method for Two-Dimensional Electromagnetic Problems
• Diffraction, Fourier Optics and Imaging
• Finite Element Approximation of Time Harmonic Waves in Periodic Structures
• Finite element analysis of acoustic scattering
• Finite element solution of conical diffraction problems
• Inverse acoustic and electromagnetic scattering theory.
• Maximum likelihood estimation and inference. With examples in R, SAS and ADMB
• Modeling and optimal design of diffractive optical structures
• The partition of unity finite element method: basic theory and applications

Cited in

(5)

• Model-assisted SCAD calibration for non-probability samples
• Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
• A comparison of scattering angle models
• A model function method for determining the regularizing parameter in potential approach for the recovery of scattered wave
• Sensitivity analysis for indirect measurement in scatterometry and the reconstruction of periodic grating structures

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