Identification of spatial defects in semiconductor manufacturing
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Publication:6579680
DOI10.1002/ASMB.2615MaRDI QIDQ6579680FDOQ6579680
Authors: Riccardo Borgoni, Chiara Galimberti, Diego Zappa
Publication date: 25 July 2024
Published in: Applied Stochastic Models in Business and Industry (Search for Journal in Brave)
minimum spanning tree algorithmalpha-shapes\(p\)-value control chartsintegrated circuits fabrication
Cites Work
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- Statistical Analysis and Modelling of Spatial Point Patterns
- Principal Curves
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- Graph-Theoretical Methods for Detecting and Describing Gestalt Clusters
- On the shape of a set of points in the plane
- Monitoring Wafer Map Data from Integrated Circuit Fabrication Processes for Spatially Clustered Defects
- Model-based clustering for integrated circuit yield enhancement
- Selection of alpha for alpha-hull in \(\mathbb{R}^ 2\)
- Control charts for multivariate spatial autoregressive models
- Statistics for microelectronics
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