A lamp thermoelectricity based integrated bake/chill system for photoresist processing

DOI10.1016/J.IJHEATMASSTRANSFER.2006.07.016zbMATH Open1107.80306OpenAlexW1993229294MaRDI QIDQ865848FDOQ865848

Authors: Arthur Tay, Hui Tong Chua, Xiaodong Wu 

Publication date: 20 February 2007

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2006.07.016

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zbMATH Keywords

temperature controlthermoelectricitymicrolithographylamp heatingphotoresist processing

Mathematics Subject Classification ID

Waves and radiation in optics and electromagnetic theory (78A40) Transport processes in time-dependent statistical mechanics (82C70)

Cited In (2)

• Thermal budget control for processes with spike-shaped temperature profiles: application to rapid thermal annealing
• Optimal thermal actuation for mirror temperature control

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