A lamp thermoelectricity based integrated bake/chill system for photoresist processing

DOI10.1016/J.IJHEATMASSTRANSFER.2006.07.016MaRDI QIDQ865848zbMATH OpenOpenAlexFDO

Authors Arthur Tay, Hui Tong Chua, Xiaodong Wu

Publication date 20 February 2007

Published in International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/j.ijheatmasstransfer.2006.07.016

zbMATH Keywords

temperature controlthermoelectricitymicrolithographylamp heatingphotoresist processing

Mathematics Subject Classification ID

Waves and radiation in optics and electromagnetic theory (78A40) Transport processes in time-dependent statistical mechanics (82C70)

Recommendations

• Thermal budget control for processes with spike-shaped temperature profiles: application to rapid thermal annealing
• Design-tool for Rapid Thermal Processors for Optimal Trajectory Tracking
• Optimal design of induction heating equipment for high‐speed processing of a semiconductor
• Application of the NEPSAC nonlinear predictive control strategy to a semiconductor reactor
• 3-D finite element simulation of wafer thermal distortion and stress fields in exposure process

Cited in

(2)

• Thermal budget control for processes with spike-shaped temperature profiles: application to rapid thermal annealing
• Optimal thermal actuation for mirror temperature control

This page was built for publication: A lamp thermoelectricity based integrated bake/chill system for photoresist processing

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q865848)