A level set approach to a unified model for etching, deposition, and lithography. I: Algorithms and two-dimensional simulations

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Publication:1902653

DOI10.1006/jcph.1995.1153zbMath0864.65086OpenAlexW2022218976MaRDI QIDQ1902653

David Adalsteinsson, James A. Sethian

Publication date: 7 January 1996

Published in: Journal of Computational Physics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1006/jcph.1995.1153



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