Spatial defect pattern recognition on semiconductor wafers using model-based clustering and Bayesian inference

DOI10.1016/J.EJOR.2007.06.007zbMATH Open1146.90400OpenAlexW1980136853MaRDI QIDQ2482829FDOQ2482829

Way Kuo, Tao Yuan

Publication date: 24 April 2008

Published in: European Journal of Operational Research (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ejor.2007.06.007

zbMATH Keywords

stochastic processespattern recognitionquality controlsemiconductor manufacturing

Mathematics Subject Classification ID

Production models (90B30) Spatial models in economics (91B72)

Cites Work

• Title not available (Why is that?)
• Estimating the dimension of a model
• Model-Based Clustering, Discriminant Analysis, and Density Estimation
• Detecting Features in Spatial Point Processes with Clutter via Model-Based Clustering
• Model-Based Gaussian and Non-Gaussian Clustering
• Principal Curves
• An introduction to the theory of point processes
• Model-based clustering with noise: Bayesian inference and estimation
• Model-based clustering for integrated circuit yield enhancement
• Spatial defect pattern recognition on semiconductor wafers using model-based clustering and Bayesian inference

Cited In (1)

• Spatial defect pattern recognition on semiconductor wafers using model-based clustering and Bayesian inference

Uses Software

• BayesDA

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