scientific article; zbMATH DE number 108274
From MaRDI portal
Publication:4023732
zbMATH Open0797.35086MaRDI QIDQ4023732FDOQ4023732
Authors: W. Merz
Publication date: 23 January 1993
Title of this publication is not available (Why is that?)
Recommendations
Reaction-diffusion equations (35K57) Numerical methods for partial differential equations, initial value and time-dependent initial-boundary value problems (65M99) Numerical methods for partial differential equations, boundary value problems (65N99)
Cited In (8)
- Construction of an Asymptotic Model for the Oxidation Process of Silicon
- On modelling thermal oxidation of Silicon II: numerical aspects
- A modified Deal-Grove thermal oxidation model for silicon wafers
- Recent advances in models for thermal oxidation of silicon
- The oxidation process of silicon: Modelling and mathematical treatment
- Title not available (Why is that?)
- Oxidation-induced stresses in the isolation oxidation of silicon
- Free boundary problem for a viscous compressible flow associated with oxidation of silicon
This page was built for publication:
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q4023732)