A hybrid finite element‐finite difference method for thermal analysis in X‐ray lithography

DOI10.1108/09615539910276160MaRDI QIDQ4952969zbMATH OpenOpenAlexFDO

Authors Weizhong Dai, Raja Nassar

Publication date 29 January 2001

Published in International Journal of Numerical Methods for Heat & Fluid Flow (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1108/09615539910276160

zbMATH Keywords

\(X\)-ray irradiation process\(X\)-ray lithographyblock tridiagonal linear systemsdomain decomposition algorithmhybrid finite element-finite difference schemeparallel Gaussian eliminationtemperature profilethin layersthree-dimensional numerical methodthree-dimensional parabolic equations

Mathematics Subject Classification ID

Technical applications of optics and electromagnetic theory (78A55) Thermodynamics and heat transfer (80A99) Finite element, Galerkin and related methods applied to problems in thermodynamics and heat transfer (80M10) Finite difference methods applied to problems in thermodynamics and heat transfer (80M20)

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Cites work

• A three‐dimensional numerical method for thermal analysis in X‐ray lithography

Cited in

(6)

• An unconditionally stable finite difference scheme for solving a 3D heat transport equation in a sub-microscale thin film
• A finite difference scheme for solving a three-dimensional heat transport equation in a thin film with microscale thickness
• Hybrid asymptotic-numerical modeling of thin layers for dynamic thermal analysis of structures
• Mathematical model and computer simulation of three dimensional thin film elliptic interface problems
• A three‐dimensional numerical method for thermal analysis in X‐ray lithography
• 3-D finite element simulation of wafer thermal distortion and stress fields in exposure process

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