A hybrid finite element‐finite difference method for thermal analysis in X‐ray lithography

DOI10.1108/09615539910276160MaRDI QIDQ4952969zbMATH OpenOpenAlexFDO

Authors Weizhong Dai, Raja Nassar

Publication date 29 January 2001

Published in International Journal of Numerical Methods for Heat & Fluid Flow (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1108/09615539910276160

zbMATH Keywords

thin layerstemperature profileblock tridiagonal linear systemsparallel Gaussian eliminationthree-dimensional parabolic equationsdomain decomposition algorithmthree-dimensional numerical method\(X\)-ray irradiation process\(X\)-ray lithographyhybrid finite element-finite difference scheme

Mathematics Subject Classification ID

Technical applications of optics and electromagnetic theory (78A55) Finite difference methods applied to problems in thermodynamics and heat transfer (80M20) Finite element, Galerkin and related methods applied to problems in thermodynamics and heat transfer (80M10) Thermodynamics and heat transfer (80A99)

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Cites work

• A three‐dimensional numerical method for thermal analysis in X‐ray lithography

Cited in

(6)

• A three‐dimensional numerical method for thermal analysis in X‐ray lithography
• Mathematical model and computer simulation of three dimensional thin film elliptic interface problems
• Hybrid asymptotic-numerical modeling of thin layers for dynamic thermal analysis of structures
• An unconditionally stable finite difference scheme for solving a 3D heat transport equation in a sub-microscale thin film
• 3-D finite element simulation of wafer thermal distortion and stress fields in exposure process
• A finite difference scheme for solving a three-dimensional heat transport equation in a thin film with microscale thickness

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