Thin film/substrate systems featuring arbitrary film thickness and misfit strain distributions. I: Analysis for obtaining film stress from non-local curvature information

DOI10.1016/J.IJSOLSTR.2006.10.016MaRDI QIDQ869280zbMATHOpenAlexFDO

Authors N. E. Zubov

Publication date 2 March 2007

Published in International Journal of Solids and Structures (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/j.ijsolstr.2006.10.016

zbMATH Keywords

thin filmsinterfacial shearsnon-uniform misfit strainnon-local stress-curvature relationsnon-uniform film thickness

Mathematics Subject Classification ID

Theory of constitutive functions in solid mechanics (74A20)

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Cited in

(9)

• Asymptotic analysis of an adhesive joint with mismatch strain
• Thin film/substrate systems featuring arbitrary film thickness and misfit strain distributions. II: Experimental validation of the non-local stress/curvature relations
• Residual stresses in silicon-on-sapphire thin film systems
• Analysis of film strain and stress in a film-substrate cantilever system
• The role of the sample shape and size on the internal stress induced curvature of thin-film substrate systems
• Extension of Stoney's formula to non-uniform temperature distributions in thin film/substrate systems. The case of radial symmetry
• Non-uniform, axisymmetric misfit strain in thin films bonded on plate substrates/substrate systems: the relation between non-uniform film stresses and system curvatures
• Multi-layer thin films/substrate system subjected to non-uniform misfit strains
• A microbeam bending method for studying stress-strain relations for metal thin films on silicon substrates

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