Oxidation-induced stresses in the isolation oxidation of silicon (Q1577265)
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scientific article; zbMATH DE number 1501175
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| English | Oxidation-induced stresses in the isolation oxidation of silicon |
scientific article; zbMATH DE number 1501175 |
Statements
Oxidation-induced stresses in the isolation oxidation of silicon (English)
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21 March 2002
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finite difference method
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two-dimensional isolation oxidation of silicon
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reaction-controlled limit
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long-wave approximation
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oxidation-induced stresses
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Keller-box discretisation scheme
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nitride-cap rigidity
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silicon/silicon-oxide interface
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0.9371931
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0.8826152
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0.84268343
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0.84193623
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