Oxidation-induced stresses in the isolation oxidation of silicon (Q1577265)
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| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Oxidation-induced stresses in the isolation oxidation of silicon |
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Oxidation-induced stresses in the isolation oxidation of silicon (English)
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21 March 2002
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finite difference method
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two-dimensional isolation oxidation of silicon
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reaction-controlled limit
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long-wave approximation
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oxidation-induced stresses
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Keller-box discretisation scheme
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nitride-cap rigidity
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silicon/silicon-oxide interface
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