A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching
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Cited in
(7)- scientific article; zbMATH DE number 4217735 (Why is no real title available?)
- Modeling two-dimensional diffusion-controlled wet chemical etching using a total concentration approach
- Total concentration approach for three-dimensional diffusion-controlled wet chemical etching
- A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole
- Sequencing optimisation for makespan improvement at wet-etch tools
- Asymptotic analysis of a multi-component wet chemical etching model
- Numerical solution of an etching problem
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