Modeling two-dimensional diffusion-controlled wet chemical etching using a total concentration approach
DOI10.1016/J.IJHEATMASSTRANSFER.2005.09.021zbMATH Open1189.76761OpenAlexW2107180837MaRDI QIDQ981303FDOQ981303
Authors: J. Martínez
Publication date: 30 June 2010
Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2005.09.021
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