A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

DOI10.1023/A:1022080019181zbMath1024.76060MaRDI QIDQ1404099

Hendrik K. Kuiken

Publication date: 20 August 2003

Published in: Journal of Engineering Mathematics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1023/a:1022080019181

zbMATH Keywords

asymptotic solutions; oblate spheroidal coordinates; diffusion-controlled wet-chemical etching; mask opening

Mathematics Subject Classification ID

76R50: Diffusion

76M45: Asymptotic methods, singular perturbations applied to problems in fluid mechanics

80A32: Chemically reacting flows

76V05: Reaction effects in flows