A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole
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Publication:1404099
DOI10.1023/A:1022080019181zbMath1024.76060MaRDI QIDQ1404099
Publication date: 20 August 2003
Published in: Journal of Engineering Mathematics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1023/a:1022080019181
asymptotic solutions; oblate spheroidal coordinates; diffusion-controlled wet-chemical etching; mask opening
76R50: Diffusion
76M45: Asymptotic methods, singular perturbations applied to problems in fluid mechanics
80A32: Chemically reacting flows
76V05: Reaction effects in flows