A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole
DOI10.1023/A:1022080019181zbMATH Open1024.76060OpenAlexW2121508477MaRDI QIDQ1404099FDOQ1404099
Authors: Hendrik K. Kuiken 
Publication date: 20 August 2003
Published in: Journal of Engineering Mathematics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1023/a:1022080019181
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asymptotic solutionsoblate spheroidal coordinatesdiffusion-controlled wet-chemical etchingmask opening
Diffusion (76R50) Chemically reacting flows (80A32) Asymptotic methods, singular perturbations applied to problems in fluid mechanics (76M45) Reaction effects in flows (76V05)
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